Control in sub-100 nm lithography in SAL-601-Reference-Cited by-同舟云学术

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Control in sub-100 nm lithography in SAL-601

Published:1997-11 Issue:6 Volume:15 Page:2327
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Dobisz Elizabeth A.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis and processing;Nanomagnetic Materials;2021

2. Nanofabrication by electron beam lithography and its applications: A review;Microelectronic Engineering;2015-03

3. On the similarities between micro/nano lithography and topology optimization projection methods;Structural and Multidisciplinary Optimization;2013-06-12

4. Advanced patterning techniques for nanodevice fabrication;Journal of Materials Science: Materials in Electronics;2003

5. Line Edge Roughness of Developed Resist with Low-Dose Electron Beam Exposure;Japanese Journal of Applied Physics;2002-06-30

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