Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. II. Preparation and characterization of AlxTiyOz thin films-Reference-Cited by-同舟云学术

Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. II. Preparation and characterization of AlxTiyOz thin films

Published:1996-09 Issue:5 Volume:14 Page:2842-2848
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Leinen D.,Lassaletta G.,Fernández A.,Caballero A.,González‐Elipe A. R.,Martín J. M.,Vacher B.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580233

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