Atomic layer deposition of Al2O3 and AlxTi1−xOy thin films on N2O plasma pretreated carbon materials-Reference-Cited by-同舟云学术

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Atomic layer deposition of Al2O3 and AlxTi1−xOy thin films on N2O plasma pretreated carbon materials

Published:2013-01 Issue:1 Volume:31 Page:01A135
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Markeev Andrey M.,Chernikova Anna G.,Chouprik Anastasya A.,Zaitsev Sergey A.,Ovchinnikov Dmitry V.,Althues Holger,Dörfler Susanne

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4769793

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Using electron backscatter diffraction to investigate the influence of mechanical polishing on the state of the surface of diamond;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2017-01

2. Confinement-free annealing induced ferroelectricity in Hf0.5Zr0.5O2 thin films;Microelectronic Engineering;2015-11

3. Ultra-thin alumina layer encapsulation of bulk heterojunction organic photovoltaics for enhanced device lifetime;Organic Electronics;2014-01

4. Applicability of Child–Langmuir collision laws for describing a dc cathode sheath in N2O;Journal of Plasma Physics;2013-12-13

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