New in situ measurement method for nanoparticles formed in a radio frequency plasma-enhanced chemical vapor deposition reactor-Reference-Cited by-同舟云学术

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New in situ measurement method for nanoparticles formed in a radio frequency plasma-enhanced chemical vapor deposition reactor

Published:2001 Issue:5 Volume:19 Page:1998
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Seol Kwang Soo,Tsutatani Yasuyuki,Fujimoto Toshiyuki,Okada Yoshiki,Takeuchi Kazuo,Nagamoto Hidetoshi

Publisher

American Vacuum Society

Subject

General Engineering

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