Preparation and characterization of a well‐ordered surface on a Si(001) substrate with a buried metal layer for application of infrared reflection spectroscopy-Reference-Cited by-同舟云学术

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Preparation and characterization of a well‐ordered surface on a Si(001) substrate with a buried metal layer for application of infrared reflection spectroscopy

Published:1996-07 Issue:4 Volume:14 Page:2263-2268
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kobayashi Yoshihiro,Sumitomo Koji,Prabhakaran Kuniyil,Ogino Toshio

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580058

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Infrared reflection absorption study of water interaction with H-terminated Si(100) surfaces;Bulletin of Materials Science;2004-12

2. A comparative infrared study of H2O reactivity on Si(100)-(2×1), (2×1)-H, (1×1)-H and (3×1)-H surfaces;Surface Science;2004-10

3. Control of surface composition on Ge/Si(001) by atomic hydrogen irradiation;Surface Science;1999-08

4. Observation of Ge surface segregation during Si-MBE on Ge/Si(001) probed by Si–H/Ge–H surface vibrations;Surface Science;1999-06

5. MOLECULES AT SURFACES AND INTERFACES STUDIED USING VIBRATIONAL SPECTROSCOPIES AND RELATED TECHNIQUES;Surface Review and Letters;1999-04

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