Structural study of YSi[sub 1.7] layers formed by channeled ion beam synthesis-Reference-Cited by-同舟云学术

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Structural study of YSi[sub 1.7] layers formed by channeled ion beam synthesis

Published:1998-07 Issue:4 Volume:16 Page:1901
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Wu M. F.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. STUDY OF ION BEAM SYNTHESIZED YSi2-x LAYERS;International Journal of Nanoscience;2010-12

2. Dose-dependent precipitate evolution arising during implantation of Er into Si;Journal of Applied Physics;2005-04-15

3. A study of the formation of yttrium silicides epitaxially grown on Si(111);Surface and Interface Analysis;2004-08

4. Metal Silicides in CMOS Technology: Past, Present, and Future Trends;Critical Reviews in Solid State and Materials Sciences;2003-11

5. Electrical properties of rare earth silicides produced by channeled ion beam synthesis;Microelectronic Engineering;2000-01

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