Growth and electron field emission characteristics of nanodiamond films deposited in N[sub 2]/CH[sub 4]/H[sub 2] microwave plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Growth and electron field emission characteristics of nanodiamond films deposited in N[sub 2]/CH[sub 4]/H[sub 2] microwave plasma-enhanced chemical vapor deposition

Published:2002 Issue:5 Volume:20 Page:1982
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Wang S. G.,Zhang Qing,Yoon S. F.,Ahn J.,Wang Q.,Zhou Q.,Yang D. J.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Carbon-Based Quantum Cathodes;Vacuum Nanoelectronic Devices;2015-07-23

2. Advanced nanodiamond emitter with pyramidal tip-on-pole structure for emission self-regulation;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-03

3. Field emission from nanodiamond grown with ‘ridge’ type geometrically enhanced features;Diamond and Related Materials;2008-04

4. Enhanced electron field emission from micropatterned pyramidal diamond tips incorporating CH4/H2/N2 plasma-deposited nanodiamond;Diamond and Related Materials;2006-04

5. Direct correlation of surface morphology with electron emission sites for intrinsic nanocrystalline diamond films;Diamond and Related Materials;2004-04

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