Analysis and optimization of sputter deposited AlN-layers for flexural plate wave devices-Reference-Cited by-同舟云学术

Analysis and optimization of sputter deposited AlN-layers for flexural plate wave devices

Published:2016-09 Issue:5 Volume:34 Page:052001
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Reusch Markus¹,Holc Katarzyna²,Pletschen Wilfried²,Kirste Lutz²,Žukauskaitė Agnė²,Yoshikawa Taro²,Iankov Dimitre²,Ambacher Oliver²,Lebedev Vadim²

Affiliation:

1. Laboratory for Compound Semiconductor Microsystems, IMTEK-Department of Microsystems Engineering, University of Freiburg, Georges-Koehler-Allee 103, 79110 Freiburg, Germany

2. Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany

Funder

Deutsche Forschungsgemeinschaft (DFG)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4959580

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