The influence of ion bombardment on reactions between Ti and gaseous N2-Reference-Cited by-同舟云学术

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The influence of ion bombardment on reactions between Ti and gaseous N2

Published:1990-03 Issue:2 Volume:8 Page:861-867
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kant R. A.,Sartwell B. D.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576931

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ion Implantation;Kirk-Othmer Encyclopedia of Chemical Technology;2005-03-18

2. Surface nitridation processes and non-linear behaviour of the reactive magnetron discharge with titanium target;Vacuum;2001-05

3. Ion Beam Assisted Texture Evolution during Thin Film Deposition of Metal Nitrides;MRS Proceedings;2000

4. Atomistic Film Growth and Some Growth-Related Film Properties;Handbook of Physical Vapor Deposition (PVD) Processing;1998

5. Energetic particles in PVD technology: particle-surface interaction processes and energy-particle relationships in thin film deposition;Surface and Coatings Technology;1996-05

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