Self-aligned structures by a single-step through-membrane 100-keV electron beam lithography-Reference-Cited by-同舟云学术

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Self-aligned structures by a single-step through-membrane 100-keV electron beam lithography

Published:2019-09 Issue:5 Volume:37 Page:051602
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Gorelick Sergey¹²^ORCID,de Marco Alex¹²³

Affiliation:

1. Department of Biochemistry and Molecular Biology, Faculty of Medicine, Nursing and Health Sciences, 23 Innovation Walk, 3800 Clayton, Victoria, Australia

2. ARC Centre of Excellence in Advanced Molecular Imaging, Monash University, Clayton, Victoria 3800, Australia

3. University of Warwick, Coventry CV4 7AL, United Kingdom

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5114948

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