Tantalum carbide etch characterization in inductively coupled Ar∕Cl2∕HBr plasmas
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Published:2006-09
Issue:5
Volume:24
Page:1764-1775
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Kawai H.,Rauf S.,Luckowski E.,Ventzek P. L. G.
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics