Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3

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Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3–ZrO2 thin films

Published:2006-03 Issue:2 Volume:24 Page:309-316
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Trinh D. H.,Högberg H.,Andersson J. M.,Collin M.,Reineck I.,Helmersson U.,Hultman L.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.2171709

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An upgraded ultra-high vacuum magnetron-sputtering system for high-versatility and software-controlled deposition;Vacuum;2021-05

2. Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films;Surfaces;2021-04-27

3. Comparative study of oxidizing ambient infused with varying nitrogen flow rates for fabrication of ternary nitrided AlZrO based MOS capacitor;International Journal of Energy Research;2020-10-10

4. Preparation and characterisation of aluminium zirconium oxide for metal‐oxide‐semiconductor capacitor;International Journal of Energy Research;2020-07-23

5. Passivation of silicon substrate using two-step grown ternary aluminium doped zirconium oxide;Applied Surface Science;2019-11

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