The effect of oxygen and substrate temperature on the growth of Ti thin films on stainless‐steel substrates
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.572118
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The role of passivation in titanium oxidation: thin film and temperature effects;Applied Surface Science;2002-02
2. TiNxOy as a barrier between Cr-Si-(O) and aluminium thin films;Thin Solid Films;1991-05
3. Influence of substrate bias and pressure on microstructure of TiN x films reactively sputtered by cylindrical post magnetron;Czechoslovak Journal of Physics;1986-06
4. Auger-Elektronen-Mikroanalyse Grundlagen und Anwendungen;Angewandte Oberflächenanalyse mit SIMS Sekundär-Ionen-Massenspektrometrie AES Auger-Elektronen-Spektrometrie XPS Röntgen-Photoelektronen-Spektrometrie;1986
5. Surface characterization;Analytical Chemistry;1985-04-01
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