Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica
Author:
Affiliation:
1. Department of Chemistry, University of Colorado, 215 UCB, Boulder, Colorado 80309-0215
Funder
Semiconductor Research Corporation
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
https://avs.scitation.org/doi/pdf/10.1116/6.0000769
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