Pulsed laser deposition of highly oriented stoichiometric thin films of topological insulator Sb2Te3-Reference-Cited by-同舟云学术

Pulsed laser deposition of highly oriented stoichiometric thin films of topological insulator Sb2Te3

Published:2016-03 Issue:2 Volume:34 Page:021806
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Saha Biswajit¹,Chaturvedi Pragati,Yadav Anil K.,Saha Dipankar,Ganguly Swaroop

Affiliation:

1. Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India

Funder

Department of Electronics and Information Technology, Ministry of Communications and Information Technology (DeitY)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4943026

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