Characterization of thin film deposits on tungsten filaments in catalytic chemical vapor deposition using 1,1-dimethylsilacyclobutane
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Published:2016-09
Issue:5
Volume:34
Page:051517
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Shi Yujun1,
Tong Ling1,
Mulmi Suresh1
Affiliation:
1. Department of Chemistry, University of Calgary, Calgary, Alberta T2N 1N4, Canada
Funder
Natural Sciences and Engineering Research Council of Canada (NSERC)
Canada Foundation for Innovation (CFI)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics