High resolution organic resists for charged particle lithography
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Introductory Chapter: The Eminence of Lithography—New Horizons of Next-Generation Lithography;Micro/Nanolithography - A Heuristic Aspect on the Enduring Technology;2018-05-02
2. Negative-tone organic molecular resists;Materials and Processes for Next Generation Lithography;2016
3. Effect of molecular weight distribution on e-beam exposure properties of polystyrene;Nanotechnology;2013-05-20
4. Sub-20 nm laser ablation for lithographic dry development;Nanotechnology;2012-04-13
5. Development of Novel Resist Materials for Micro-lithographic Patterning;Journal of Synthetic Organic Chemistry, Japan;2011
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