Roles of N2 gas in etching of platinum by inductively coupled Ar/Cl2/N2 plasmas-Reference-Cited by-同舟云学术

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Roles of N2 gas in etching of platinum by inductively coupled Ar/Cl2/N2 plasmas

Published:2000-07 Issue:4 Volume:18 Page:1377-1380
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ryu Jae-Heung,Kim Nam-Hoon,Kim Hyeon-Soo,Yeom Geun-Young,Chang Eui-Goo,Kim Chang-Il

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.582357

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Low Damage Etching Process of Sub-100 nm Platinum Gate Line for III–V Metal–Oxide–Semiconductor Field-Effect Transistor Fabrication and the Optical Emission Spectrometry of the Inductively Coupled Plasma of SF$_{6}$/C$_{4}$F$_{8}$;Japanese Journal of Applied Physics;2012-01-20

2. A Low Damage Etching Process of Sub-100 nm Platinum Gate Line for III–V Metal–Oxide–Semiconductor Field-Effect Transistor Fabrication and the Optical Emission Spectrometry of the Inductively Coupled Plasma of SF6/C4F8;Japanese Journal of Applied Physics;2012-01-01

3. The parameters of plasma and the kinetics of generation and loss of active particles in chlorine-nitrogen mixtures;High Temperature;2008-07-30

4. Structural and surface properties of NiCr thin films prepared by DC magnetron sputtering under variation of annealing conditions;Microelectronic Engineering;2005-12

5. Chemical Reaction During Pt Etching with SF6/Ar and Cl2/Ar Plasma Chemistries;Japanese Journal of Applied Physics;2003-04-15

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