Fabrication of ultrathin (∼100 nm), low-index nanoporous silica films for photonic devices: Role of substrate adhesion on the film thickness-Reference-Cited by-同舟云学术

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Fabrication of ultrathin (∼100 nm), low-index nanoporous silica films for photonic devices: Role of substrate adhesion on the film thickness

Published:2006 Issue:3 Volume:24 Page:1109
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Ojha M.,Gill W. N.,Plawsky J. L.,Cho W.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Artificial opal photonic crystals and inverse opal structures – fundamentals and applications from optics to energy storage;Journal of Materials Chemistry C;2015

2. Optical bonding with fast sol-gel;Journal of the European Optical Society: Rapid Publications;2009-06-01

3. Engineered nanoporous and nanostructured films;Materials Today;2009-06

4. Fast sol–gel technology: from fabrication to applications;Journal of Sol-Gel Science and Technology;2009-01-08

5. Low-index mesoporous silica films modified with trimethylethoxysilane;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2008-04

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