Laser diagnostic techniques for reactive ion etching: Plasma understanding to process control
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.575597
Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dry Etching of Electronic Oxides, Polymers, and Semiconductors;Plasma Processes and Polymers;2005-01-12
2. Plasma Chemistry;Wiley Encyclopedia of Electrical and Electronics Engineering;1999-12-27
3. Laser-Induced Fluorescence;Optical Diagnostics for Thin Film Processing;1996
4. Practical aspects for the use of plasma emission monitoring in reactive magnetron sputtering processes;Vacuum;1994-12
5. Cleaning of metal parts in oxygen radio frequency plasma: Process study*;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-03
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