Band gap and strain engineering of pseudomorphic Ge1−x−ySixSny alloys on Ge and GaAs for photonic applications
Author:
Affiliation:
1. Department of Electrical and Computer Engineering, University of Delaware, 140 Evans Hall, Newark, Delaware 19716
2. Department of Physics, New Mexico State University, MSC 3D, P.O. Box 30001, Las Cruces, New Mexico 88003
Funder
National Science Foundation
DOD | United States Army | RDECOM | Army Research Office
DOD | USAF | AFMC | Air Force Office of Scientific Research
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://avs.scitation.org/doi/am-pdf/10.1116/1.5001948
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