Electron beam lithography process using radiation sensitive carboxylate metalorganic precursors-Reference-Cited by-同舟云学术

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Electron beam lithography process using radiation sensitive carboxylate metalorganic precursors

Published:2003 Issue:6 Volume:21 Page:3157
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Jeyakumar Augustin,Henderson Clifford L.,Roman Paul,Suh Seigi

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. X-ray absorption fine structure study of amorphous metal oxide thin films prepared by photochemical metalorganic deposition;Journal of Solid State Chemistry;2011-05

2. Fabrication of sub 50-nm direct-patterned Pb(Zr,Ti)O3 films by electron beam-induced metal-organic deposition;Journal of Electroceramics;2009-01-08

3. Top-down meets bottom-up — Electron-beam induced metalorganic deposition of amorphous iron oxide nanostructures;Canadian Journal of Chemistry;2009-01-01

4. High Resolution Electron Beam Lithographic Deposition of Metal and Metal Oxide Films from Metal Complexes;MRS Proceedings;2007

5. Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics;Journal of The Electrochemical Society;2004

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