Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light-Reference-Cited by-同舟云学术

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Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light

Published:2004-07 Issue:4 Volume:22 Page:1615-1619
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Shirahata Naoto,Oda Kotaro,Asakura Shuuichi,Fuwa Akio,Yokogawa Yoshiyuki,Kameyama Tetsuya,Hozumi Atsushi

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1692318

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Excilamp Photochemistry;CRC Handbook of Organic Photochemistry and Photobiology, Third Edition - Two Volume Set;2012-03-21

2. Cell Patterning Using a Template of Microstructured Organosilane Layer Fabricated by Vacuum Ultraviolet Light Lithography;Langmuir;2011-09-22

3. Vacuum-ultraviolet Photochemically Initiated Modification of Polystyrene Surfaces: Chemical Changes¶,‡;Photochemistry and Photobiology;2007-04-30

4. Characterization of a UV–VUV light source based on a gas-target ns-laser-produced plasma;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2007-01

5. Photopatterning of an Organic Monolayer Formed on a Si Single Crystal Surface via Si–C Covalent Bond by UV Irradiation in an Inert Atmosphere;Japanese Journal of Applied Physics;2006-11-08

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