Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks-Reference-Cited by-同舟云学术

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Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks

Published:2005 Issue:6 Volume:23 Page:2860
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Farys Vincent,Charpin-Nicolle Christelle,Richard Marieke,Robic Jean-Yves,Muffato Viviane,Quesnel Etienne,Postnikov Sergeï,Schiavone Patrick,Besacier Maxime,Smaali Rafik,Naulleau Patrick

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extreme Ultraviolet Lithography;Lithography;2013-03-07

2. Analysis of Printability of Scratch Defect on Reflective Mask in Extreme Ultraviolet Lithography;Japanese Journal of Applied Physics;2006-12-07

3. Simulation analysis of printability of scratch and bump defects in EUV lithography;SPIE Proceedings;2006-03-10

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