In situ XPS study on atomic layer etching of Fe thin film using Cl2 and acetylacetone
Author:
Affiliation:
1. Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716
2. Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716
Funder
Air Liquide American
National Science Foundation
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/am-pdf/10.1116/1.5039517
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