High brightness inductively coupled plasma source for high current focused ion beam applications-Reference-Cited by-同舟云学术

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High brightness inductively coupled plasma source for high current focused ion beam applications

Published:2006 Issue:6 Volume:24 Page:2902
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Smith N. S.,Skoczylas W. P.,Kellogg S. M.,Kinion D. E.,Tesch P. P.,Sutherland O.,Aanesland A.,Boswell R. W.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

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