Wet-cleaning of MgO(001): Modification of surface chemistry and effects on thin film growth investigated by x-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectroscopy-Reference-Cited by-同舟云学术

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Wet-cleaning of MgO(001): Modification of surface chemistry and effects on thin film growth investigated by x-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectroscopy

Published:2017-03 Issue:2 Volume:35 Page:021407
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Le Febvrier Arnaud¹,Jensen Jens¹,Eklund Per¹

Affiliation:

1. Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden

Funder

european research council (ERC) starting

Knut och Alice Wallenbergs Stiftelse (Knut and Alice Wallenberg Foundation)

Svenska Forskningsrådet Formas (Swedish Research Council Formas)

Stiftelsen för Strategisk Forskning (SSF)

VINNOVA (Swedish Governmental Agency for Innovation Systems)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4975595

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