Broadband UV-assisted thermal annealing of low-k silicon carbonitride films using a C-rich silazane precursor-Reference-Cited by-同舟云学术

Broadband UV-assisted thermal annealing of low-k silicon carbonitride films using a C-rich silazane precursor

Published:2018-11 Issue:6 Volume:36 Page:060601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Chang Wei-Yuan¹,Chung Hau-Ting¹,Chen Yi-Chang¹,Leu Jihperng¹

Affiliation:

1. Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan

Funder

Ministry of Science and Technology, Taiwan

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5063294

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