Fabrication of grating coupled GaAs/AlGaAs quantum well infrared photodetector on an Si substrate-Reference-Cited by-同舟云学术

Fabrication of grating coupled GaAs/AlGaAs quantum well infrared photodetector on an Si substrate

Published:2019-05 Issue:3 Volume:37 Page:031209
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Kim HoSung¹,Ahn Seung-Yeop²,Wasilewski Zbigniew¹³

Affiliation:

1. Department of Electrical and Computer Engineering, University of Waterloo, 200 University Ave. W, Waterloo, Ontario N2L 3G1, Canada

2. Center for Opto-Electronics Materials and Devices, Korea Institute of Science and Technology (KIST), 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul 02792, Republic of Korea

3. Department of Physics and Astronomy, Waterloo Institute for Nanotechnology (WIN), and Institute for Quantum Computing (IQC), University of Waterloo, 200 University Ave. W, Waterloo, Ontario N2L 3G1, Canada

Funder

Korea Institute of Science and Technology

Natural Sciences and Engineering Research Council of Canada

Waterloo Institute for Nanotechnology, University of Waterloo

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5088967

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