Threshold voltage adjustment on spherical, single-crystal silicon substrates by focused ion beam implantation
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Published:2006
Issue:6
Volume:24
Page:3221
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ISSN:1071-1023
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:en
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Short-container-title:J. Vac. Sci. Technol. B
Author:
Zomorrodian V.,Craver B.,Radhakrishnan G.,Patel M.,Charlson E. J.,Ruchhoeft P.,Wolfe J. C.
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics