Effect of pressure on the deposition of hydrogen-free amorphous carbon and carbon nitride films by the pulsed cathodic arc discharge method
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Published:2004-11
Issue:6
Volume:22
Page:2329-2335
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Liu Dongping,Benstetter Günther,Wang Wenchun,Zhang Jialiang
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
1 articles.
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1. Thin Film Tribological Materials;Introduction to Surface Engineering and Functionally Engineered Materials;2011-09-30