Study of the effect of layer thickness, beam energy, and metal density on the resistless silicide direct-write electron-beam lithography process for the fabrication of nanostructures
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.582247
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Formation of micro-/nano-structures on the surface of Cr thin films by electron beam irradiation;Journal of Non-Crystalline Solids;2018-11
2. The Impact of Charging on Low-Energy Electron Beam Lithography;Microscopy and Microanalysis;2004-12
3. Low-energy ion-implantation-induced quantum-well intermixing;IEEE Journal of Selected Topics in Quantum Electronics;2002-07
4. Characterization of Phase Transformation by Fe-SEM and Fe-TEM Analysis;Microscopy and Microanalysis;2001-08
5. Resistless electron beam lithography technique for the fabrication of x-ray masks;SPIE Proceedings;2001-04-09
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