Use of a Metallic Ion Source in Cold Cathode Sputter Ion Pumps
-
Published:1972-01
Issue:1
Volume:9
Page:383-386
-
ISSN:0022-5355
-
Container-title:Journal of Vacuum Science and Technology
-
language:en
-
Short-container-title:Journal of Vacuum Science and Technology
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Pumping of helium and hydrogen by sputter‐ion pumps. II. Hydrogen pumping;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-05
2. References;Vacuum Technology;1990
3. Pumps;Ultrahigh Vacuum Practice;1985
4. Pumps for ultra-high vacuum;Vacuum;1978-05
5. Recent Developments in Vacuum Science and Technology;Vacuum Manual;1974