Selective growth of TiO[sub 2] thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods-Reference-Cited by-同舟云学术

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Selective growth of TiO[sub 2] thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods

Published:2003 Issue:4 Volume:21 Page:1773
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Kang B.-C.,Lee J.-H.,Chae H.-Y.,Jung D.-Y.,Lee S.-B.,Boo J.-H.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Micropatterning of TiO2 Thin Films by MOCVD and Study of Their Growth Tendency;Scientific Reports;2015-03-23

2. Selective atomic layer deposition with electron-beam patterned self-assembled monolayers;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-01

3. Metallic Materials Deposition: Metal-Organic PrecursorsBased in part on the article Metallic Materials Deposition: Metal-Organic Precursors by Herbert D. Kaesz, Alfred Zinn, & Lutz Brandt which appeared in theEncyclopedia of Inorganic Chemistry, First Edition.;Encyclopedia of Inorganic and Bioinorganic Chemistry;2011-12-15

4. The effect of CoO impurity and substrate temperature on optical properties of TiO2 thin films;SPIE Proceedings;2011-09-30

5. Nano/Micro Patterning of Inorganic Thin Films;Bulletin of the Chemical Society of Japan;2008-11-15

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