Evolution of titanium residue on the walls of a plasma-etching reactor and its effect on the polysilicon etching rate
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Published:2014-11
Issue:6
Volume:32
Page:061304
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Hirota Kosa,Itabashi Naoshi,Tanaka Junichi
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics