Inductively coupled plasma reactive ion etching of ZnO using BCl[sub 3]-based plasmas-Reference-Cited by-同舟云学术

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Inductively coupled plasma reactive ion etching of ZnO using BCl[sub 3]-based plasmas

Published:2003 Issue:4 Volume:21 Page:1273
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Kim Han-Ki,Bae J. W.,Kim T.-K.,Kim K.-K.,Seong T.-Y.,Adesida I.

Publisher

American Vacuum Society

Subject

General Engineering

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