Photoelectron spectroscopy studies of Tm silicide films on Si(111)-Reference-Cited by-同舟云学术

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Photoelectron spectroscopy studies of Tm silicide films on Si(111)

Published:1993-09 Issue:5 Volume:11 Page:2665-2671
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Wigren C.,Andersen J. N.,Nyholm R.,Karlsson U. O.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578623

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Formation of the CeSix/Si(111) interface;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-07

2. Rare earth overlayers on silicon;Journal of Physics: Condensed Matter;1995-02-06

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