Integrated model for chemically enhanced physical vapor deposition of tantalum nitride-based films
-
Published:2006
Issue:3
Volume:24
Page:1162
-
ISSN:1071-1023
-
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
-
language:en
-
Short-container-title:J. Vac. Sci. Technol. B
Author:
Li Ning,Brenner P. W.,Ruzic D. N.
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics