Fluorophore-based sensor for oxygen radicals in processing plasmas-Reference-Cited by-同舟云学术

Fluorophore-based sensor for oxygen radicals in processing plasmas

Published:2015-11 Issue:6 Volume:33 Page:061305
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Choudhury Faraz A.¹,Sabat Grzegorz²,Sussman Michael R.²,Nishi Yoshio³,Shohet J. Leon¹

Affiliation:

1. Plasma Processing and Technology Laboratory and Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706

2. Department of Biochemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706

3. Department of Electrical Engineering, Stanford University, Stanford, California 94305

Funder

National Science Foundation (NSF)

Semiconductor Research Corporation (SRC)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4930315

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