Anisotropic Ta2O5 waveguide etching using inductively coupled plasma etching-Reference-Cited by-同舟云学术

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Anisotropic Ta2O5 waveguide etching using inductively coupled plasma etching

Published:2014-07 Issue:4 Volume:32 Page:041304
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Muttalib Muhammad Firdaus A.,Chen Ruiqi Y.,Pearce Stuart J.,Charlton Martin D. B.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4884557

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-Order-Mode supercontinuum generation based on shortcut to adiabaticity coupling;Optics & Laser Technology;2024-12

2. Antireflective Multi‐Dielectric Metasurfaces Operating in the Visible;Laser & Photonics Reviews;2023-11-10

3. Free-standing tantalum pentoxide waveguides for gas sensing in the mid-infrared;Optical Materials Express;2021-08-23

4. Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches;Journal of Vacuum Science & Technology A;2021-05

5. Optimization of reactive-ion etching (RIE) parameters for fabrication of tantalum pentoxide (Ta2O5) waveguide using Taguchi method;EPJ Web of Conferences;2017

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