Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing

Published:2022-01 Issue:1 Volume:40 Page:012601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Dawant Raphaël¹²^ORCID,Seils Robyn³^ORCID,Ecoffey Serge¹²^ORCID,Schmid Rainer.³^ORCID,Drouin Dominique¹²^ORCID

Affiliation:

1. Institut Interdisciplinaire d’Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada

2. Laboratoire Nanotechnologies Nanosystèmes (LN2)—CNRS IRL-3463—3IT, Sherbrooke J1K 0A5, Canada

3. Raith America, Inc., International Applications Center, 300 Jordan Road, Troy, New York 12180

Funder

Natural Sciences and Engineering Research Council of Canada

Mitacs

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001278

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP