Inductively coupled plasma etching of Si1−xGex in CF4∕Ar and Cl2∕Ar discharges
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Published:2006-05
Issue:3
Volume:24
Page:728-731
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Wu San Lein,Lee Chun Hsin,Chang Shoou Jinn,Lin Yu Min
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics