Reliable fabrication of sub-40 nm period gratings using a nanolithography system with interferometric dynamic focus control-Reference-Cited by-同舟云学术

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Reliable fabrication of sub-40 nm period gratings using a nanolithography system with interferometric dynamic focus control

Published:1996-11 Issue:6 Volume:14 Page:4115
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Cumming D. R. S.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Diffusion Mechanism for Self Assembly on Inhomogeneously Strained Surfaces;MRS Proceedings;2003

2. Sub - 35 nm metal gratings fabricated using PMMA with high contrast developers;Microelectronic Engineering;1998-03

3. Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-01

4. Fabrication of microlens arrays by direct electron beam exposure of photoresist;Pure and Applied Optics: Journal of the European Optical Society Part A;1997-11

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