Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition-Reference-Cited by-同舟云学术

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Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

Published:2012-01 Issue:1 Volume:30 Page:01A139
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Park Taeyong,Lee Jaesang,Park Jingyu,Jeon Heeyoung,Jeon Hyeongtag,Lee Ki-Hoon,Cho Byung-Chul,Kim Moo-Sung,Ahn Heui-Bok

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3666033

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic Layer Deposition: Overview and Applications;Korean Journal of Materials Research;2013-08-27

2. Low-temperature atomic layer deposition of Al2O3 on blown polyethylene films with plasma-treated surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-01

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