Polishing effect of the plasma on the growth of YBa2Cu3O7−δ films by radio frequency sputtering-Reference-Cited by-同舟云学术

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Polishing effect of the plasma on the growth of YBa2Cu3O7−δ films by radio frequency sputtering

Published:2002-03 Issue:2 Volume:20 Page:441-446
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Chou Hsiung,Lin P. I.,Hsu C. C.,Chow T. C.,Hong M. T.,Chen Y. C.,Liu J. R.,Tsai T. P.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1450579

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of Al-doped ZnO thin film as a transparent cathode and anode for application in transparent organic light-emitting diodes;RSC Advances;2016

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