Influence of substrate holder configurations on bias enhanced nucleation area for diamond heteroepitaxy: Toward wafer-scale single-crystalline diamond synthesis-Reference-Cited by-同舟云学术

Influence of substrate holder configurations on bias enhanced nucleation area for diamond heteroepitaxy: Toward wafer-scale single-crystalline diamond synthesis

Published:2019-03 Issue:2 Volume:37 Page:021207
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Yoshikawa Taro¹,Herrling David¹,Meyer Frank²,Burmeister Frank²,Nebel Christoph E.¹,Ambacher Oliver¹³,Lebedev Vadim¹

Affiliation:

1. Fraunhofer Institute for Applied Solid State Physics IAF, Tullastraße 72, 79108 Freiburg, Germany

2. Fraunhofer Institute for Mechanics of Materials IWM, Woehlerstrasse 11, 79108 Freiburg, Germany

3. Institute for Sustainable Systems Engineering (INATECH), Albert-Ludwigs-University Freiburg, Emmy-Noether-Str. 2, 79110 Freiburg, Germany

Funder

Fraunhofer Zukunftsstiftung

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5086020

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