Improved Auger electron spectroscopy sputter depth profiling of W/WNx and WSix layers on Si substrates-Reference-Cited by-同舟云学术

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Improved Auger electron spectroscopy sputter depth profiling of W/WNx and WSix layers on Si substrates

Published:2001-09 Issue:5 Volume:19 Page:2174-2180
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Goryachko A.,Krüger D.,Kurps R.,Weidner G.,Pomplun K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1378073

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal stability of Pr[sub 2]O[sub 3] films grown on Si(100) substrate;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002

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