Fluorinated amorphous carbon thin films: Analysis of the role of the plasma source frequency on the structural and optical properties-Reference-Cited by-同舟云学术

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Fluorinated amorphous carbon thin films: Analysis of the role of the plasma source frequency on the structural and optical properties

Published:2001-09 Issue:5 Volume:19 Page:2168-2173
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Valentini L.,Braca E.,Kenny J. M.,Lozzi L.,Santucci S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1378071

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical and Electrical Characteristics of Fluorocarbon Films Deposited in a High-Density C₄F₈ Plasma;KOREAN CHEM ENG RES;2021

2. On the Hydrophilicity and Water Resistance Effect of Styrene-Acrylonitrile Copolymer Treated by CF4 and O2 Plasmas;Plasma Processes and Polymers;2015-04-07

3. Modification of carbon nano-objects in low-temperature plasma for use in polymer nanocomposites;High Energy Chemistry;2012-07

4. Fabrication of fluorine-terminated diamond-like carbon thin film using a hyperthermal atomic fluorine beam;Diamond and Related Materials;2011-05

5. Fluorination deposition on carbon nanofibers by PTFE decomposition as a facile method to enhance dispersion and interaction in PVDF composites;J. Mater. Chem.;2011

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