1. Silicon etching yields in F2, Cl2, Br2, and HBr high density plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2001-09
2. Anisotropic Initial Stage of Laser-Induced Chlorine Reaction on Si(111) Observed by Surface-Sensitive Optical Methods;Japanese Journal of Applied Physics;2000-07-30
3. Silicon Compounds, Inorganic;Ullmann's Encyclopedia of Industrial Chemistry;2000-06-15
4. Symmetry of, and polarized-laser-induced reactions on, Si (111)/Cl2 surfaces studied by second-harmonic generation;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1998-09
5. Chlorine chemisorption and reaction on the Si(111) surface and its characterization using second-harmonic generation;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1997-05