Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds-Reference-Cited by-同舟云学术

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Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds

Published:2018-03 Issue:2 Volume:36 Page:021510
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Šilinskas Mindaugas,Kalkofen Bodo,Balasubramanian Ramasubramanian,Batmanov Anatoliy,Burte Edmund P.,Harmgarth Nicole,Zörner Florian,Edelmann Frank T.,Garke Bernd¹,Lisker Marco²

Affiliation:

1. Institute of Experimental Physics, Otto-von-Guericke University Magdeburg, Universitätsplatz 2, 39106 Magdeburg, Germany

2. IHP-Innovations for High Performance Microelectronics/Leibniz-Institut für Innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5003463

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mixed‐Anion Compounds: An Unexplored Playground for ALD Fabrication;Advanced Materials Interfaces;2021-05-06

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